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2017.07.29
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1Àå Æ÷Å丮¼Ò±×·¡ÇÇ(Photolithography)¶õ?

2Àå Æ÷Å丮¼Ò±×·¡ÇÇ(Photolithography) °øÁ¤ °úÁ¤
1. Photoresist(PR) coating
2. Type of Photoresist(PR)
3. Soft Bake

4. Hard Bake
5. Characteristic of PR
6. Nrgative PR
7. Polymerization of Negative PR
8. Positive PR
9. Comparison of Negative and Positive PR

10. Development
11. Etching Process
12. Classification of Etching
13. Wet Etching
14. Dry Etching
15. Removal of PR

Æ÷Å丮¼Ò±×·¡ÇÇ(photolithography)   
¥¡) Æ÷Å丮¼Ò±×·¡ÇÇ(photolithography)¶õ?
photolithography °øÁ¤Àº ¾î¶² ƯÁ¤ÇÑ È­ÇоàÇ°(photo resist)ÀÌ ºûÀ» ¹ÞÀ¸¸é È­ÇйÝÀÀÀ» ÀÏÀ¸ÄѼ­ ¼ºÁúÀÌ º¯ÇÏ´Â ¿ù¸®¸¦ ÀÌ¿ëÇÏ¿©, ¾ò°íÀÚ ÇÏ´Â pattenÀÇ mask¸¦ »ç¿ëÇÏ¿© ºûÀ» ¼±ÅÃÀûÀ¸·Î pr¿¡ Á¶»çÇÔÀ¸·Î½á mask patten°ú µ¿ÀÏÇÑ pattenÀ» Çü¼º½ÃÅ°´Â °øÁ¤ÀÌ´Ù.photolithography °øÁ¤Àº ÀϹݻçÁøÀÇ film¿¡ ÇØ´çÇÏ´Â photo resist¸¦ µµÆ÷ÇÏ´Â pr µµÆ÷°øÁ¤, mask¸¦ ÀÌ¿ëÇÏ¿© ¼±ÅÃÀûÀ¸·Î ºûÀ» Á¶»çÇÏ´Â ³ë±¤°øÁ¤, ´ÙÀ½¿¡ Çö»ó¾×À» ÀÌ¿ëÇÏ¿© ºûÀ» ¹ÞÀº ºÎºÐÀÇ prÀ» Á¦°ÅÇÏ¿© pattenÀ» Çü¼º½ÃÅ°´Â Çö»ó°øÁ¤À¸·Î ±¸¼ºµÈ´Ù.
photolithography °øÁ¤Àº ¸ðµç °øÁ¤ stepÀÌ °¢Á¾ particle¿¡ ´ëÇØ ¸Å¿ì Ãë¾àÇÏ°í, ÀÌ·Î ÀÎÇÑ pattern ºÒ·®ÀÌ Àüü panelÀÇ ºÒ·®À» À¯¹ßÇϹǷÎ, ûÁ¤ÇÑ È¯°æ°ú Àç·á ¹× ÀåºñÀÇ °ü¸®°¡ º¸´Ù Áß¿äÇÑ °øÁ¤À̸ç, ÇâÈÄ tft Á¦ÀÛ°øÁ¤ÀÇ °íÁ¤¹Ð, ´ë¸éÀûÈ­¿¡ µû¶ó¼­ ±× Á߿伺ÀÌ ´õ¿í Ä¿Áö´Â °øÁ¤ÀÌ´Ù.
¥¢) Æ÷Å丮¼Ò±×·¡ÇÇ(photolithography) °øÁ¤ °úÁ¤
a) photoresist(pr) coating   wafer Ç¥¸é¿¡ prµµÆ÷  ¡Ø µµÆ÷¹æ½Ä  
-dipping
-spray
-·ê·¯
-spin
¡Ø ¿µÇâÀ» ÁÖ´Â ¿äÀΠ 
-Á¡¼º°è¼ö, ´ÙÁßü ÇÔ·®,
½ºÇɼӵµ¿Í °¡¼Ó, Ç¥¸éû°áµµ   °¨±¤¸·ÀÇ µÎ²²  Çü¼ºµÉ »óÀÇ ÃÖ¼Ò Å©±â °áÁ¤ ¿äÀΠ ¡æ ½ºÇɼӵµ¿¡ µû¸¥ prµÎ²² º¯È­  b) type of photoresist(pr)   ±¤¹ÝÀÀ ¸ÞÄ¿´ÏÁò  
-°¡°í¹ÝÀÀÇü
-ºÐÇعÝÀÀÇü
-º¯¼ºÇü
¹ÝµµÃ¼»ç¾÷¿¡¼­  
-dnq novolak photoresist
-chemical amplification resist
c) soft bake   °¨±¤Á¦ÀÇ ¿ëÁ¦Á¦°Å, Á¢ÇÕÀ» Çâ»ó  
-xxxx.xx.xxc 5~10min
¼ÒÇÁÆ® º£ÀÌÅ©ÀÇ ¹®Á¦Á¡  ¨Í ¿Âµµ°¡ ³·Àº °æ¿ì  
-°¨±¤Á¦ÀÇ »óÈ£ ¿¬°áÀÌ ÃæºÐÈ÷ ÀϾÁö ¾Ê¾Æ ³ëÃâ Çö»ó ¹ß»ý(-)
-¸¶½ºÅ©¿Í ¿þÀÌÆÛ°¡ ¼­·Î ºÙ´Â °Í(,-)
¨Î ¿Âµµ°¡ ³ôÀº °æ¿ì  
-´ÙÁßÈ­¸¦ ÀÏÀ¸ÄÑ ½ºÄÄ Çü¼ºµÊ(-)
d) hard bake   xxxx.xx.xx¡Æc 20~30min ±¸¿ò  ¡æ °¨±¤¸·ÀÇ Á¢Âøµµ Áõ°¡   ¼ÒÇÁÆ® º£ÀÌÅ©¿Í Â÷ÀÌÁ¡  
-¿­¿¡ ÀÇÇØ »ý±â´Â °¨±¤¸·ÀÌ ³ëÃâ¿¡ ´ëÇÑ ¿µÇâÀ» °í·ÁÇÒ ÇÊ¿ä°¡ ¾ø´Ù.
-bake ÇÏ´Â ½Ã°£ÀÌ ´õ ±æ´Ù.
-¿Âµµ°¡ ³Ê¹« ³ô°Å³ª ½Ã°£ÀÌ ±æ¸é ¿À¹Ç¶óµå´Â Çö»ó ¹ß»ýÇÔ.   (ÀÌÇÏ »ý·«)

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